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Betting on a 2009 recovery? Not so fast
Nov 01 -- Gartner now expects capex to slide even further this year (-25% to $47.1B) and will drop another 13% in 2009 to $41.1B, thanks to a full-on collapse in memory investments and economic pressures on consumer spending habits. Look for a pickup in 2010 (16.7% to $47.9B) and a bigger surge in 2011 (23.1% to $59.0B), and then another downturn in 2012 (-10.5% to $52.8B)....
Diskcon: HDD litho crossover happening now
Nov 01 -- A full-day symposium at this year’s Diskcon USA (Sept. 14-18) explored the lithography implications of sub-ITRS roadmap feature sizes on disk drives, with the challenge that HDD lithography must cost 10Ã? less than NAND flash lithography, the lowest-cost semiconductor process....
Kudos to Tech Award Laureates
Nov 01 -- This month, a group of individuals will receive some well deserved recognition for their work in developing technical solutions that benefit humanity and address the most critical issues facing our planet and its people....
To 32nm and beyond: a design-manufacturing symbiosis
Nov 01 -- At the 32nm node, technology enablers such as double-patterning, strain enhancement, advanced OPC, etc., require design for manufacturing (DFM) to support a design through manufacturing (D2M) methodology that is correct-by-construction....
DRAM, NAND woes seen spilling into 2009
Oct 01 -- Despite a mild recovery in 2Q08, global DRAM makers are once again building inventories and pulling the rug out from prices, and the buildup will likely push out a full market recovery until the end of next year, according to a new warning by iSuppli....
Defect-inspection tool for monitor wafers
Oct 01 -- The SurfScan SP2XP monitor-wafer defect inspection system incorporates upgrades from the original edge-handling version SurfScan SP2XP, including improved sensitivity to defects on silicon/poly/metal films and enhanced ability to sort defects by type and size....
MoSi-ing along to 32nm
Oct 01 -- The chrome material that has blocked the light on binary masks for a generation may finally have outlived its usefulness, according to Franklin Kalk, CTO of Toppan Photomasks, in an exclusive interview with SST....
Product News
Oct 01 -- These two tools for wafer edge (E30) and backside inspection (B30) provide improved sensitivity and high throughput for inspection and in-line monitoring of 32nm FEOL and BEOL manufacturing processes....
Three years, two months to 2012
Oct 01 -- We’re pleased to be bringing you this special issue, the result of a collaborative effort between ISMI and Solid State Technology, initiated last year....
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