Using combinatorial science to qualify new processes and materials
The introduction of new materials into semiconductor manufacturing process flows is generating unprecedented improvements in integrated circuit (IC) performance.
III-V MOSFETs for future CMOS transistor applications
III-V semiconductors are commonplace in laser and lighting applications and provide enabling components, such as power amplifiers, for mobile products including handsets and WLAN transceivers.
High-k etch performance for next-generation logic gate stacks
Dry etching is essential for high-performance metal gate/high-k devices at 45nm and beyond.
Photovoltaics World Launch
We have been covering the photovoltaics manufacturing industry for quite some time in Solid State Technology and a variety of other PennWell brands, most notably Renewable Energy World, Laser Focus Wo ...
Analysts: “Long, dark season” ahead
Many OEMs held off on the usual holiday-season production ramp amid expectations of weak consumer demand due to the global economic crisis, and this has created a ripple effect all along the electroni ...
Haze and sun for mask symposium
Ever since lithographers began exposing with 193nm DUV light, photomasks have accumulated photochemical haze that eventually congeals into crystalline defects.
Inside Oxford/TDI’s HVPE technique for InGaN growth
TDI, an Oxford Instruments company, recently announced that it has developed a hydride vapor phase epitaxy (HVPE) technology that is based on a GaCl3-InCl3-NH3 system.
KLA-Tencor gets the noise out with latest plasma monitor
KLA-Tencor recently introduced the PlasmaVolt X2 for measurement of plasma chamber conditions in semiconductor wafer processing systems.